Plasma cleaning and etchers plasma clean plasma etch, inc. Reactive ion etching and plasma desmear equipment, including the patented magna system which requires no cf4 gas for etch back. Micro nanofabrication services at ubc vancouvers anf. The pe 100 is a complete plasma cleaning system capable of plasma cleaning, etching, reactive ion etching, and more. The pe200 is an industrial strength bench top plasma etching system and plasma cleaner supplied with an oxygen service vacuum pump. This particular system is designed for solar cell edge isolation.
Plasma etching dry etching is a plasmabased process that facilitates the removal of material from the surface of a substrate. The equipment can be configured to etch either a 4 or a 6 wafer. Plasma etch manufacture an extensive range of benchtop plasma cleaner and plasma etching equipment. Plasma etchs polymerization line of plasma systems includes pe100, pe200 and bt1 based machines. This pe200 benchtop plasma etch system is fully automated and is capable of processing multiple parts up to x. Siemens plasma finish plasma etcher system semistar. With 9x electrodes, the pe100 can handle large parts up to.
Sep 23, 2008 this pe 200 benchtop plasma etch system is fully automated and is capable of processing multiple parts up to x16. Plasma etch pe100 200 benchtop systems with our new pc based controller. This model is perfect for manufacturers, universities, research facilities, or any other company in need of a costeffective, high yield plasma. It was purchased by oxford instruments in 1989, and was renamed to oxford instrument plasma technology oipt. The pe 200 is our largest benchtop model with considerable processing space and a wide variety of options. The pe200 is a complete industrial grade plasma treatment solution capable of plasma cleaning, etching, reactive ion etching rie, and more. The mps series is also available as an oem module to integrate to existing system platforms. Reactive ion etching systems rie plasma etching samco inc. The technics pe ii is a plasma induced etcher that can be used for photoresist ashing. Each system includes heatedliquid monomer vapor delivery integrated into the gas delivery system, which is said to provide reliability and repeatability. This robust, reliable and yet quite affordable system was developed for the busy 247 manufacturing firm that cannot have down. Ibd chambers can be integrated with ion beam etch ibe chambers to enable multiple processing steps within a single system.
This model is available in one of three possible configurations. The plasma action provides increased uniformity for any surface treatment. A plasma creates ions, and neutral species that are drawn to a biased electrode. When using the pe 100 as reactive ion etch the electrodes are specially designed for directional plasma, which means the plasma contacts the substrates in a downward flow or drilling effect. Surface cleaning, and surface treatment andor etching of various materials. Equipment description and operating instructions for plasma. The machines incorporate advanced rf sources, providing highquality performance and optimum process results. The plasma etching is a dry etching process whereby the surface material is removed by plasma processes at low pressure. Three horizontal levels are perfect for small batches of processed parts. This pe200 benchtop plasma etch system is fully automated and is capable of processing multiple parts up to x16. In plasma etcher, high etch rates at moderate power levels of 100 watts forward power can be achieved 200 aminute for oxide and 500aminute for nitride. The pe 50 plasma cleaning system can use up to two gases simultaneously to clean and modify the surface. Plasma etch system unity me plasma etch system surface preparation system cellesta i md single wafer cleaning system. Plasma etch pe100 benchtop plasma cleaning system youtube.
Oxford plasma technology etch and deposition products. The chamber accommodates multiple 4 wafers or a single 6 wafer. Az4110p photoresist etch rate is roughly 20 nmmin with an o2 plasma at full power and 200 mtorr. The pe200 is our industrial strength bench top plasma etching system and supplied with an oxygen service vacuum pump. Multiple recipe storage with fully automatic system and process control. The type of the active gasses and their ratio is selected depending on the type of material to be. This listing is for a tegal plasmaline model 421 barrel etch plasma system wafer etcher w gauges local pickup always welcome. Depending on the type of etching dry or wet, plasma consists of either ions or radicals. The rie200nl is a load lock type high precision plasma reactive ion etching system that can be used to etch all types of semiconducting, insulating and metallic films. This robust, reliable and yet quite affordable system was developed for the busy 247 manufacturing firm that cannot have downtime. This model is perfect for manufacturers, universities, research facilities, or any other company in need of a costeffective, high yield plasma processing solution.
Plasmatherms ibd provides bestinclass uniformity and grid life. The pe100 is a complete plasma treatment solution capable of reactive ion etching, plasma functionalization, and more. The technics peii a is a plasma etching system used for descummingashing of photoresist and nitride etching. The gases are controlled by the manual mass flow controllers visible at upper right while the plasma power is controlled by the rotary knob to the left of the touchpad panel. Manual load or a variety of vacuum load locks are available. Weve developed a wide range of solutions for plasma cleaning, plasma etching, reactive ion etching rie, plasma treatment, surface modification, and other facets of plasma processing. In plasma etching gases are used which can create a phase change of the etched. The pe 200 is an industrial strength bench top plasma etching system supplied with an oxygen service vacuum pump. The tool is equipped with a temperature controlled electrode to help users tailor their etch feature profiles. Oxford plasma technology was established in 1982 as a startup called plasma technology pt. This process is primarily used for drilling microvias or cleaning of small variations that are unattainable with chemicals since liquid flow is often.
Pe ioo benchtop plasma system the pe 100 is a complete plasma treatment solution capable of plasma cleaning, plasma etching, reactive ion etching, and more. May 16, 2012 plasma etch pe100 200 benchtop systems with our new pc based controller. Bt1 industrial plasma processing system plasma etch, inc. Note that the substrate heater is disconnected, so the heater dial in the upperleft corner does not work. The pe 100 is a complete plasma treatment solution capable of reactive ion etching, plasma functionalization, and more. Pe 50 plasma etcher the plasma etching is a dry etching process whereby the surface material is removed by plasma processes at low pressure.
Power requirements 200250v, 20 amps, 5060 hz, 1 phase system weight 158. Plasma etch pe50 plasma etchercleaner micro nanofabrication. In order to etch a material with plasma, the etching system generates highspeed pulses of plasma. Technics pe ii planar etch ii plasma etcher asher with. The pe 200 is a complete industrial grade plasma treatment solution capable of plasma cleaning, etching, reactive ion etching rie, and more. The pe200 is a complete plasma treatment solution capable of plasma cleaning, plasma etching, reactive ion etching, and more. Pe200 industrial benchtop plasma processing system. Switching time pressure rf coil power rf bias power gas flow sccm etch 858. Plasma etching techniques including rie, pe, icp, and drie.
Plasma etcher model pe 2000, electron microscopy sciences vwr. Plasma etching dry etching is a plasma based process that facilitates the removal of material from the surface of a substrate. Pe 200 industrial benchtop plasma processing system. Its goal was to focus on plasma etch and deposition tools for the research market. This system may be used either in manual or auto mode. Used plasma etch pe100 for sale by bid service, llc used. The unit is capable of 150 watts rf forward power at. The company has grown to become a leading manufacturer of plasma cleaning and etching systems. Plasma etching and the benefits over liquid etching. Plasma etching is performed in a vacuum environment and involve four mechanisms, which must be understood for effective etch system design.
Plasma etch is the use of a radio frequency rf excited plasma to produce chemically reactive species from various gases. John explains the operational and maintenance aspects of this innovative plasma cleaningetching system. The most common plasma etch configurations are reactive ion etch rie, planar etch pe, inductively coupled plasma etch icp etch, or deep reactive ion etch drie etch. The pe 200 is our industrial strength bench top plasma etching system and supplied with an oxygen service vacuum pump. Our plasma etch products are built on our highthroughput platform to provide high overall equipment efficiency. The process of plasma etching also results in the production of volatile chemical compounds, formed as byproducts during the chemical reaction between the. Plasma etching techniques are typically classed by the configuration of the electrodes. Equipment description and operating instructions for plasma therm metal etcher ptmtl version 1 it is a single wafer etcher with a load lock. This model is perfect for manufacturers, medical facilities, universities, research facilities, or any other company in need of a costeffective, productiongrade plasma processing solution. This robust, reliable and yet quite affordable system was developed for the busy 247 manufacturing firm that c. The planar etch ii pe2 machine is a parallelplate plasma etcher. Individual process steps are set by operator manually.
The pe200 is a complete industrial grade plasma treatment solution capable of plasma cleaning, plasma etching, reactive ion etching, and more. The reactive plasma is exposed to the wafer surface and etches away the material not protected by a masking layer. Plasma cleaner plasma cleaning equipment tabeltop plasma. The plasma etch pe ioo is our most affordable complete plasma system. Benchtop plasma cleaner for large devices batch sizes.
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